Phosphorus is reddish brown amorphous with metallic luster solid material and in two state of red phosphorus and white phosphorus. Red phosphorus, sublimation at 4160C, can be steamed into white phosphorus after cooling, It can also burn with oxygen to form phosphorus pentoxides, and easily generate three and five phosphorus halides When reacting with halogen compounds
High purity Phosphorus of 99.999% and 99, 9999% 5N 6N is mainly used for the production of III-V compound semiconductors such as Indium Phosphide InP, Gallium Phosphide GaP etc, and also be used as the doped element of N-type single crystal silicon and germanium growth etc.
No. | Items | Standard Specification | ||
1 | Shape | Circular | Circular | Square |
2 | Size | 2″ | 4″ | – |
3 | Diameter mm | 50.8±0.5 | 100±0.5 | – |
4 | Side Length mm | – | – | 10×10 or 10×5 |
5 | Growth Method | HVPE | HVPE | HVPE |
6 | Orientation | C-plane (0001) | C-plane (0001) | C-plane (0001) |
7 | Conductivity Type | N/(Si-doped or un-doped), Semi-insulating | ||
8 | Resistivity Ω-cm | <0.1, <0.05, >1E6 | ||
9 | Thickness μm | 350±25 | 350±25 | 350±25 |
10 | TTV μm max | 15 | 15 | 15 |
11 | Bow μm max | 20 | 20 | 20 |
12 | EPD cm-2 | <5E8 | <5E8 | <5E8 |
13 | Surface Finish | P/E, P/P | P/E, P/P | P/E, P/P |
14 | Surface Roughness | Front: ≤0.2nm, Back: 0.5-1.5μm or ≤0.2nm | ||
15 | Packing | Single wafer container sealed in Aluminum bag. |
Linear Formula | GaN |
Molecular Weight | 83.73 |
Crystal structure | Zinc blende or Wurtzite |
Apperance | Translucent solid |
Melting Point | 2500 °C |
Boiling Point | N/A |
Density at 300K | 6.15 g/cm3 |
Energy Gap | (3.2-3.29) eV at 300K |
Intrinsic resistivity | >1E8 Ω-cm |
CAS Number | 25617-97-4 |
EC Number | 247-129-0 |