Sulfur or Sulphur is light yellow brittle crystal material. It dissolves in carbon disulfide and ethanol but insoluble in water, and can burn vigorously in oxygen.
High Purity Sulfur of 99.999% 5N and 99.9999% 6N in form of powder, lump, granule or flake by rectification process is primarily used in the manufacturing of II-VI compound semiconductors CdS, Arsenic Sulfide As2S3, Gallium Sulfide Ga2S3, Titanium Sulfide TiS2, Selenium Sulfide SeS2, Multi-element Sulfide Composite Electrode Material, photoelectric devices, glass semiconductor elements, Sodium sulfur batteries, CIS copper indium sulfur thin film solar cell and as analysis calibration specimens.
High Purity Sulfur at Western Minmetals (SC) Corporation with 99.999% 99.9999% 5N 6N purity is in size of powder, granule, lump, tablet and pill or customized specification can be delivered, which is packed in vacuumed composite aluminum bag, polyethylene bottle with cardboard drum or carton box outside.
No. | Items | Standard Specification | |||
1 | Size | 2″ | 3″ | 4″ | 6″ |
2 | Diameter mm | 50.8 0.38 | 76.2 0.38 | 100 0.5 | 150 0.5 |
3 | Growth Method | MOCVD | MOCVD | MOCVD | MOCVD |
4 | Conductivity Type | 4H-N, 6H-N, 4H-SI, 6H-SI | |||
5 | Resistivity Ω-cm | 0.015-0.028; 0.02-0.1; >1E5 | |||
6 | Orientation | 0°±0.5°; 4.0° towards <1120> | |||
7 | Thickness μm | 330±25 | 330±25 | (350-500)±25 | (350-500)±25 |
8 | Primary Flat Location | <1-100>±5° | <1-100>±5° | <1-100>±5° | <1-100>±5° |
9 | Primary Flat Length mm | 16±1.7 | 22.2±3.2 | 32.5±2 | 47.5±2.5 |
10 | Secondary Flat Location | Silicon face up: 90°, clockwise from prime flat ±5.0° | |||
11 | Secondary Flat Length mm | 8±1.7 | 11.2±1.5 | 18±2 | 22±2.5 |
12 | TTV μm max | 15 | 15 | 15 | 15 |
13 | Bow μm max | 40 | 40 | 40 | 40 |
14 | Warp μm max | 60 | 60 | 60 | 60 |
15 | Edge Exclusion mm max | 1 | 2 | 3 | 3 |
16 | Micropipe Density cm-2 | <5, industrial; <15, lab; <50, dummy | |||
17 | Dislocation cm-2 | <3000, industrial; <20000, lab; <500000, dummy | |||
18 | Surface Roughness nm max | 1(Polished), 0.5 (CMP) | |||
19 | Cracks | None, for industrial grade | |||
20 | Hexagonal Plates | None, for industrial grade | |||
21 | Scratches | ≤3mm, total length less than substrate diameter | |||
22 | Edge Chips | None, for industrial grade | |||
23 | Packing | Single wafer container sealed in Aluminum bag. |
Linear Formula | SiC |
Molecular Weight | 40.1 |
Crystal structure | Wurtzite |
Apperance | Solid |
Melting Point | 3103±40K |
Boiling Point | N/A |
Density at 300K | 3.21 g/cm3 |
Energy Gap | (3.00-3.23) eV |
Intrinsic resistivity | >1E5 Ω-cm |
CAS Number | 409-21-2 |
EC Number | 206-991-8 |